Andrew Moore Quotes
You don't just want a mask image that will give you an acceptable pattern at exact focus and dose. You want the pattern on the wafer to be acceptable over a reasonable range of focus and dose errors and variations in resist. 
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Mask | Image | Acceptable | Pattern | Exact |
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You don't just want a mask image that will give you an acceptable pattern at exact focus and dose. You want the pattern on the wafer to be acceptable over a reasonable range of focus and dose errors and variations in resist.
- Andrew Moore
The conventional process of reticle enhancement is highly iterative and time-consuming. First it's necessary to segment the design into areas to be treated in like manner. Then you iteratively move an edge, simulate the resulting image, and if that result isn't good enough, move [the edge] some more.
- Andrew Moore